Argonne National Laboratory

This PDF is a printable list of scientific contacts for the Center for Nanoscale Materials (CNM).


Nanofabrication and Devices

  • Anirudha Sumant (Group Leader)
    superlubricity, diamond-based NEMS, CNT, graphene wear/friction measurements
  • David Czaplewski
    MEMS/NEMS, electron beam lithography, CVD
  • Alan Dibos
  • Ralu Divan
    electron beam lithography, nanogels, MEMS/NEMS
  • Xu Han
    high-frequency piezo-optomechanical spectroscopy, CVD, ultralow temperature/strong magnetic field measurement, FIB/SEM dual beam imaging and patterning
  • C. Suzanne Miller
    XeF2, evaporation, RTP, dicing saw
  • Fubo Rao
    clean room manager
  • Liliana Stan
    ALD, PVD, sputtering, evaporation

Major Tools

  • JEOL 8100FS, 100kV electron beam lithography
  • Raith 150, 30kV electron beam lithography
  • FEI Nova 600 NanoLab DualBeam FIB/SEM
  • Karl Suss MA6 Optical mass aligner
  • ASML PAS 5000 wafer stepper
  • Direct write optical lithography
  • Interferometric lithography
  • Xactix XeF2 etcher
  • BlueFors LD400 10mK Dilution Refrigerator System
  • AMI 5-1-1Telsa Vector Magnet
  • Wet chemistry & metrology
  • Bruker FastScan AFM
  • Deposition (Temescal ebeam evaporators, AJAs, atomic layer deposition (ALD), etc.)
  • Lambda microwave plasma CVD nanocrystalline diamond
  • Thermal/PECVD for CNT/graphene synthesis
  • Tribometer for friction and wear measurements
  • Sonotek Ultrasonic Spray Coating System
  • Piezo-Optomechanical Spectrometer (POMS)

Quantum and Energy Materials

Major Tools

  • UHV SPM (AFM/STM) (Omicron)
  • VT-AFM (Omicron XA) with optical access
  • Createc LT-STM
  • Cryo-STM w/magnetic field
  • Scanning probe microscope, AFM (Veeco)
  • Kurt Lesker electron beam evaporator and sputtering, deposition
  • Agilent ICP-OES
  • FT-IR w/ Hyperion Microscope
  • Magnetometry (QD PPMS & MPMS)
  • Luminescence/ UV-vis-NIR
  • X-ray diffractometer (Bruker D2 & D8)
  • Integrated glovebox system
  • RheoXPCS/SAXS at Sector 8 of APS

Theory and Modeling

  • Subramanian Sankaranarayanan (Group Leader)
    nanoscale oxide energy materials, machine learning
  • Henry Chan
    multi-scale modeling, soft materials, AI/ML for imaging and inverse design, scientific software development
  • Maria Chan
    photovoltaics, photocatalysts, thermoelectrics, batteries, informatics, atomistic modeling integration w/expt
  • Pierre Darancet
    charge and energy transport, optoelectronics; exciton dynamics
  • Stephen Gray
    nanophotonics, electrodynamics
  • Michael Sternberg
    software development

Major Tools

Nanoscience Computational Facility 30 TFlop cluster for:

  • Densityfunctional-based tight-binding
  • Time-domain nanophotonics simulation
  • MPI-based parallel versions of nanophotonics and tightbinding codes
  • GPAW; real space, grid-based DFTPAW
  • Access to Argonne computer facilities
  • Support for experimental projects
  • Support for theoretical projects
  • (DFTB) electronic structure package

Nanophotonics and Biofunctional Structures

Major Tools

  • Ultrafast transient absorption spectroscopy
  • Confocal Raman microscope, Renishaw
  • VIS/NIR microscopy
  • Time-resolved emission spectroscopy
  • Time-correlated single photon counting
  • UV-to-TH3 ultrafast spectroscopy
  • Single photon microscope for optics (SNSPD)
  • Fluorescence spectroscopy
  • Field-emission SEM (JEOL JSM7500F)
  • Electron paramagnetic resonance (Bruker)
  • Peptide synthesizer
  • Adiabatic demagnetization refrigerator (ADR)
  • Functionalization, electro/photochemical
  • Laser Scanning Confocal Microscope (Zeiss)
  • Post-self-assembly processing
  • ZetaSizer Nano, Malvern
  • Solar simulator, QEMS (Oriel)
  • FTIR (ThermoNicolet)
  • Synthesis & surface modification of nanoparticles
  • Magneto-ElectricalOptical Spectrometer (MEOS)
  • Microfluidic Droplet Generation and Imaging

Electron and X-ray Microscopy

  • Martin Holt (Group Leader)
    X-ray diffraction, pytchography and fluorescence

Electron Microscopy

Synchrotron X-ray Microscopy

Major Tools

Electron Microscopy

  • ACAT: Argonne Chromatic Aberration -corrected TEM
  • UEM: Ultrafast Electron Microscopy
  • FEI Talos F200X TEM/STEM
  • FEI Tecnai F20ST TEM/STEM
  • Field-emission TEM (JEOL 2100F)
  • Zeiss 1540XB FIB-SEM
  • Zeiss NVision FIBSEM
  • Hitachi S-4700-II high-vacuum SEM
  • FEI Quanta 400F environmental and variable-pressure SEM

X-ray Microscopy

  • Hard X-ray nanoprobe beamline, Sector 26 of APS
  • Scanning nanodiffraction and ptychography
  • Chemical and structural nanoimaging
  • Heating/cooling specimen stage
  • 20-30 nm resolution, 6-12 keV
  • In situ/in operando experiments